精品文档---下载后可任意编辑N 型宏孔硅光电化学腐蚀的电流自动控制技术讨论的开题报告【摘要】本讨论的目的是探究一种电流自动控制技术，以提高 N 型宏孔硅光电化学腐蚀的加工精度。首先介绍了光电化学腐蚀的基本原理以及其在微纳加工中的应用。然后阐述了 N 型宏孔硅的制备方法和光电化学腐蚀过程，指出了电流自动控制技术的重要性。接着介绍了常见的电流控制方法，并分析了优缺点。最后，提出了基于 PID 算法和 LabVIEW 平台的电流自动控制系统设计方案。【关键词】光电化学腐蚀；N 型宏孔硅；电流自动控制；PID 算法；LabVIEW【Abstract】The purpose of this study is to explore a current automatic control technology to improve the processing accuracy of N-type macroporous silicon photoelectrochemical etching. Firstly, the basic principle of photoelectrochemical etching and its application in micro-nano processing are introduced. Then the preparation method and photoelectrochemical etching process of N-type macroporous silicon are described, and the importance of current automatic control technology is pointed out. Next, common current control methods are introduced and analyzed their advantages and disadvantages. Finally, a design scheme of current automatic control system based on PID algorithm and LabVIEW platform is proposed.【Keywords】 Photoelectrochemical etching; N-type macroporous silicon; Current automatic control; PID algorithm; LabVIEW
